Press Release Details

Veeco Introduces Suite of MOCVD Systems to Enable High Performance Photonics Devices

02/04/2020
New Lumina™ Platform is Specifically Designed for High Volume Manufacturing of  VCSELs, Edge-Emitting Lasers and Mini / Micro LEDs 

Plainview, N.Y., February 4, 2020 - Veeco Instruments Inc. (Nasdaq: VECO) introduced today the Lumina Metal Organic Chemical Vapor Deposition (MOCVD) platform, which incorporates the proprietary TurboDisc® reactor technology for outstanding film uniformity, yield and device performance for a variety of photonics applications. This new MOCVD platform, including the Lumina R480™ and Lumina R480S™ models, will accelerate the production of VCSEL, Edge-Emitting Laser (EEL) and Mini / Micro LED devices. 

In response to strong consumer demand for arsenic phosphide (As/P) MOCVD technology, the Lumina platform is advancing a new generation of high-efficiency photonics devices including VCSELs used in 3D sensing, autonomous driving and high-speed data communication. The Lumina platform is also designed for mini and micro LED production for advanced displays found in next-generation 4K and 8K televisions, smartphones and wearable devices, as well as EEL devices used for advanced optical communications and silicon photonics applications.

“Leading photonics manufacturers are currently seeing the benefits of our Lumina MOCVD system and are validating its impact in the manufacturing of high-volume photonics devices,” said Gerry Blumenstock, Senior Vice President, Product Line Management.  “As the world’s leader in MOCVD equipment, the Lumina platform is the answer for the next generation VCSEL, EEL and mini / micro LED devices.  With its proven design, technology and performance, Lumina provides exciting opportunities for the next generation of photonics devices.” 

The Lumina R480 and R480S systems are based on Veeco’s industry leading MOCVD TurboDisc® technology which features excellent uniformity and low defectivity over long campaigns for exceptional yield and flexibility. In addition, Veeco’s proprietary technology drives uniform thermal control for excellent thickness and compositional uniformity. Providing a seamless wafer size transition, the system is capable of depositing high quality As/P epitaxial layers on wafers up to six inches in diameter. The R480 and R480S systems allow users to customize their systems for maximum value. 

Veeco will be exhibiting at Photonics West in San Francisco, CA from Tuesday, February 4 to Thursday, February 6.  Stop by booth number 1456 to learn more about Veeco’s MOCVD and ion beam sputtering solutions for photonics applications. 

About Veeco 
Veeco (NASDAQ: VECO) is an innovative manufacturer of semiconductor process equipment. Our proven ion beam, laser annealing, lithography, MOCVD and single wafer etch & clean technologies play an integral role in the fabrication and packaging of advanced semiconductor devices. With equipment designed to optimize performance, yield and cost of ownership, Veeco holds leading technology positions in the markets we serve. To learn more about Veeco’s systems and service offerings, visit www.veeco.com.

To the extent that this news release discusses expectations or otherwise makes statements about the future, such statements are forward-looking and are subject to a number of risks and uncertainties that could cause actual results to differ materially from the statements made. These factors include the risks discussed in the Business Description and Management's Discussion and Analysis sections of Veeco's Annual Report on Form 10-K for the year ended December 31, 2018 and in our subsequent quarterly reports on Form 10-Q, current reports on Form 8-K and press releases. Veeco does not undertake any obligation to update any forward-looking statements to reflect future events or circumstances after the date of such statements.
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Veeco Contacts:

Investors:  Anthony Bencivenga | (516) 252-1438 | abencivenga@veeco.com
Media:  Kevin Long | (516) 714-3978 | klong@veeco.com

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