New Propel Power GaN MOCVD System Expected to Accelerate the
Transition from R&D to Production for GaN Power Electronics
PLAINVIEW, N.Y.--(BUSINESS WIRE)--
Veeco Instruments Inc. (Nasdaq:VECO) introduced today the Propel™
Power Gallium Nitride (GaN) Metal Organic Chemical Vapor Deposition
(MOCVD) system, which incorporates single-wafer reactor technology
for outstanding film uniformity, yield and device performance. This new
200mm MOCVD system and technology enables the development of
highly-efficient GaN-based power electronic devices that will accelerate
the industry’s transition from R&D to high volume production.
Veeco's new Propel Power GaN MOCVD system enables the development of highly-efficient GaN-based power electronic devices that will accelerate the industry's transition from R&D to high volume production. (Photo Credit: Business Wire)
In response to strong consumer demand for power electronic devices,
gallium nitride MOCVD is advancing a new generation of power switching
devices that feature higher efficiency, smaller form factors and lower
device weight. According to IHS Research, the GaN power electronics
market is expected to grow at greater than ninety percent compound
annual growth rate from 2014 to 2020 as new devices are applied to
consumer electronics, solar and wind power, power supplies, automotive
and other applications.
“Leading power electronics manufacturers are currently progressing from
R&D to pilot production, developing and qualifying novel device
structures with a focus on improved reliability, yield and cost,” said
William J. Miller, PhD., Executive Vice President, Veeco. “As the
world’s leader in GaN MOCVD equipment, the Propel system is the answer
for the next generation of power electronic devices.” Miller added,
“With its superior design, technology and performance, Propel is a
platform that will provide exciting future growth opportunities for our
customers and for Veeco.”
The Propel MOCVD system is based on Veeco’s industry leading MOCVD
TurboDisc® technology and features long campaign runs and low particle
defects for exceptional yield and flexibility. In addition, the
proprietary SymmHeat™ technology drives uniform thermal
control for excellent thickness and compositional uniformity. Providing
a seamless wafer size transition, the system deposits high quality GaN
epitaxial layers on silicon wafers that are six and eight inches in
diameter.
“Beta testing by power electronics industry leaders has shown that the
Propel system is ideally suited for fast cycles of learning with
excellent particle performance,” said Jim Jenson, Senior Vice President
and General Manager of Veeco MOCVD. “This validation is great news for
customers as they work to develop innovative processes and technologies
for their product roadmaps. As we’ve demonstrated in the LED industry,
Veeco’s goal is to help power electronics customers also improve device
efficiency, reduce manufacturing costs, and ultimately move into
high-volume manufacturing.”
About Veeco Propel Power GaN Single-Wafer
Reactor MOCVD System
Veeco’s new Propel Power GaN MOCVD system is designed specifically for
the power electronics industry. Featuring a single-wafer 200mm reactor
platform, capable of processing six and eight-inch wafers, the system
deposits high-quality GaN films for the production of highly-efficient
power electronic devices. The single-wafer reactor is based on Veeco’s
leading TurboDisc® design with breakthrough technology including the new
IsoFlange™ and SymmHeat™ technologies that provide homogeneous laminar
flow and uniform temperature profile across the entire wafer. Customers
can easily transfer processes from Veeco K465i and MaxBright systems to
the Propel Power GaN MOCVD platform.
About Veeco
Veeco’s process equipment solutions enable the manufacture of LEDs,
flexible OLED displays, solar cells, power electronics, hard drives,
MEMS and wireless chips. We are the market leader in LED, MBE, Ion Beam
and other advanced thin film process technologies. Our high performance
systems drive innovation in energy efficiency, consumer electronics and
network storage and allow our customers to maximize productivity and
achieve lower cost of ownership. For information on our company,
products and worldwide service and support, please visit www.veeco.com.
To the extent that this news release discusses expectations or
otherwise makes statements about the future, such statements are
forward-looking and are subject to a number of risks and uncertainties
that could cause actual results to differ materially from the statements
made. These factors include the risks discussed in the Business
Description and Management's Discussion and Analysis sections of Veeco's
Annual Report on Form 10-K for the year ended December 31, 2013 and in
our subsequent quarterly reports on Form 10-Q, current reports on Form
8-K and press releases. Veeco does not undertake any obligation
to update any forward-looking statements to reflect future events or
circumstances after the date of such statements.
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Source: Veeco Instruments Inc.