PLAINVIEW, N.Y.--(BUSINESS WIRE)--
Veeco Instruments Inc. (Nasdaq: VECO) announced today that the
University of Cambridge, one of the most highly regarded research
universities in the world, has ordered the Propel™
Power Gallium Nitride (GaN) Metal Organic Chemical Vapor Deposition
(MOCVD) System for GaN-on-silicon (Si) power electronics and light
emitting diode (LED) research and development.
Headed by world-renowned Professor Sir Colin Humphreys, the system will
be installed at the Cambridge Centre for Gallium Nitride located in
Cambridge, England. Since 2000, Professor Humphreys has carried out
extensive studies of InGaN quantum wells used in LED development.
GaN-on-silicon technology is considered a potential cost saving
alternative to GaN-on-sapphire technology.
“After careful consideration, we concluded that Veeco’s Propel MOCVD
system provides a distinct advantage over other systems to improve and
expand our GaN-on-silicon R&D capabilities,” said Professor Sir Colin
Humphreys, Director of Research at The University of Cambridge. “Gallium
nitride is the most important semiconductor material since silicon for
power electronics and LEDs. The Propel PowerGaN platform enables the
growth of high performance device structures in a clean and stable
process environment with low particle defects.”
According to IHS Research, the GaN power electronics device market is
expected to grow at greater than 90% compound annual growth rate from
2014 to 2020 as new devices are applied to power supplies, consumer
electronics, automotive and other applications.
“The Propel PowerGaN single wafer system enables the development of
highly-efficient GaN-based power electronic devices that we believe will
accelerate the industry’s transition from R&D to high volume
production,” said Jim Jenson, Senior Vice President, Veeco MOCVD
Operations. “Since its introduction, our new Propel PowerGan system has
quickly gained attention for its outstanding performance. We are very
excited to have our technology recognized and adopted by such a
distinguished university that is at the forefront of GaN-on-silicon
development.”
About Veeco Propel Power GaN Single-Wafer
Reactor MOCVD System
Veeco’s new Propel Power GaN MOCVD system is designed specifically for
the power electronics industry. Featuring a single-wafer 200mm reactor
platform, capable of processing six and eight-inch wafers, the system
deposits high-quality GaN films for the production of highly-efficient
power electronic devices. The single-wafer reactor is based on Veeco’s
leading TurboDisc® design with breakthrough technology including the new
IsoFlange™ and SymmHeat™ technologies that provide homogeneous laminar
flow and uniform temperature profile across the entire wafer. Customers
can easily transfer processes from Veeco K465i™ and MaxBright® systems
to the Propel Power GaN MOCVD platform.
About The Cambridge Centre for Gallium
Nitride
The Cambridge Centre for Gallium Nitride is based in the Department of
Materials Science and Metallurgy at the University of Cambridge. They
are one of a small number of places in the world to have, in close
proximity and on the same site, gallium nitride growth equipment,
extensive advanced electron microscopy characterization facilities,
advanced X-ray diffraction characterization facilities, atomic force
microscopy, photoluminescence (PL) for measuring optical properties,
Hall effect equipment for measuring electrical properties, and basic
theory for understanding in detail physical properties. The research
team is thriving as they move into exciting new GaN based research
areas. To learn more, visit http://www.gan.msm.cam.ac.uk/
About Veeco
Veeco’s process equipment solutions enable the manufacture of LEDs,
flexible OLED displays, power electronics, compound semiconductors, hard
drives, semiconductors, MEMS and wireless chips. We are the market
leader in MOCVD, MBE, Ion Beam, Wet Etch single wafer processing and
other advanced thin film process technologies. Our high performance
systems drive innovation in energy efficiency, consumer electronics and
network storage and allow our customers to maximize productivity and
achieve lower cost of ownership. For information on our company,
products and worldwide service and support, please visit www.veeco.com.
To the extent that this news release discusses expectations or
otherwise makes statements about the future, such statements are
forward-looking and are subject to a number of risks and uncertainties
that could cause actual results to differ materially from the statements
made. These factors include the risks discussed in the Business
Description and Management's Discussion and Analysis sections of Veeco's
Annual Report on Form 10-K for the year ended December 31, 2014 and in
our subsequent quarterly reports on Form 10-Q, current reports on Form
8-K and press releases. Veeco does not undertake any obligation
to update any forward-looking statements to reflect future events or
circumstances after the date of such statements.
Source: Veeco Instruments Inc.